High-purity GF101 as well as ultra high-purity GF121 and GF126 deliver accuracy and response time suited for gas flow control in semiconductor and LED manufacturing processes. Designed for process applications that include high-flow purge, epitaxial, and blanket gas control, these controllers provide flow rates up to 300 slpm N2 equivalent. Multiple digital and analog I/O interface options support various communication protocols, and readout screens rotate 180° to facilitate viewing.
This story is related to the following:Mass Flow Controllers