Home › Precursor Source System suits ALD mass production.
 

Keywords :   


Precursor Source System suits ALD mass production.

2015-09-11 14:31:08| Industrial Newsroom - All News for Today

Equipped with Atomic Layer Deposition valves that can be heated to over 400°C, Picohot™ 400 enables efficient delivery of both solid and liquid low volatility chemicals in large doses optimal for batch processing. Source is especially suitable for metal chloride precursors, ensuring particle-free processing of hafnium oxide and many other materials on up to 300 mm wafers. Large internal volume of source container guarantees long, continuous process uptime with effective precursor utilization.

Tags: system source production mass

Category:Industrial Goods and Services

Latest from this category

All news
18.06A Request From the A League of Their Own Womens Special Interest Group
18.06Next MANAchat Series is Scheduled for the Week of August 5
17.06New Federal Government Filing Requirement Regarding Ownership of LLCs and Corporations
17.06Manufacturers Reps That Sell to International Customers June 26 Networking Event
17.06Avoid $591 Daily Penalty From the U.S. Treasury Department
15.06With Gratitude for a Job Well Done
Industrial Goods and Services »
26.06Horizon expert 'gave evidence based on informal chats'
26.06Automotive Color by BASF Recognized with Renowned Red Dot Award
26.06Beckers Commits to Widespread Science Based Targets
26.06PPG to Announce Second-quarter 2024 Results July 18
26.06Fresh Coat for First Responders: New Hampshire Fire Station Gets a Makeover by California Paints
26.06Michigan Sets Record Recycling Rate in 2023, Recycles Nearly 70,000 Tons of Materials
26.06Companies Seek Federal EPR: How Producers Can Prepare
26.06Q&A with GFLs Tyler Stefure: Integrating New Fleet Tech & Upholding GFL Values
More »