Home › UV-Ozone Cleaning System accommodates 5 x 5 in. substrates.
 

Keywords :   


UV-Ozone Cleaning System accommodates 5 x 5 in. substrates.

2014-04-08 14:31:45| Industrial Newsroom - All News for Today

Using HELIOS-500, near atomically clean surfaces can be achieved in minutes without damage to devices. System includes UV grid lamp, digital process timer, and hour-counter that records UV lamp usage for maintenance purposes. During photo-sensitized oxidation process, contaminant molecules of photo resists, resins, human skin oil, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by absorption of short wavelength UV radiation. This story is related to the following:Machinery and Machining Tools Sponsored by: AMT (IMTS) - Category Sponsor April2014Search for suppliers of: Ultraviolet (UV) Sterilizers |

Tags: in system cleaning substrates

Category:Industrial Goods and Services

Latest from this category

All news
15.05Relationship Reviews Strengthening the Partnership Between Manufacturer and Rep
14.05Consolidated Financial Statements for the twelve-month period ended March 31, 2024
14.05Actions to Implement Management that is Conscious of Cost of Capital and Stock Price
Industrial Goods and Services »
16.05'Time running out' plea over shipyard's future
16.05Eastern North Pacific Tropical Weather Outlook
16.05Atlantic Tropical Weather Outlook
16.05China's Nio unveils Tesla Model Y rival
16.05Could the US economy be doing too well?
16.05Eastern North Pacific Tropical Weather Outlook
16.05Atlantic Tropical Weather Outlook
16.05The man who turned his dead father into a chatbot
More »