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Circulating Baths Provide Precise Temperature Control for Supercritical Fluid Extraction

2014-02-12 06:00:00| Industrial Newsroom - All News for Today

Niles, IL –  A wide selection of refrigerating/heating circulating baths that provide precise temperature control for supercritical fluid extraction (SFE) applications is available from PolyScience. Designed to control temperature with stabilities as precise as ±0.005°C over temperature ranges as broad as -40° to +200°C, PolyScience Circulators are ideal for maintaining supercritical fluids such as carbon dioxide at or above their critical temperature. SFE is used in the food, ...This story is related to the following:Laboratory Refrigerated/Heating Circulators |

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Circulating Baths Provide Precise Temperature Control for Membrane Filtration Testing

2014-01-24 06:00:00| Industrial Newsroom - All News for Today

Niles, IL &mdash; A variety of Circulating Baths that provide precise temperature control for membrane filtration characterization and testing are available from PolyScience. Designed to control temperature with stabilities as precise as ±0.005°C over temperature ranges as broad as -40° to +200°C, PolyScience Circulators are ideal for a wide range of membrane testing system applications, including permeation testing, pressure decay testing, bubble point tests, and fouling experiments.<br ...This story is related to the following:Laboratory Refrigerated/Heating Circulators

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Agilent Technologies Introduces Waveguide Power Sensor For Precise, Accurate E-band Power Measurements

2014-01-23 01:54:05| rfglobalnet Home Page

Agilent Technologies Inc. recently announced the E8486A waveguide power sensor.

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Laytec Provides Precise Heating Zone Calibration

2014-01-03 05:42:13| metrologyworld News Articles

The precision of temperature measurements is crucial for a proper in-situ monitoring of epitaxial growth

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High Current Implanter delivers precise dopant placement.

2013-12-10 14:32:28| Industrial Newsroom - All News for Today

Supporting manufacture of sub 16 nm planar and 3-D devices, Purion H Single Wafer Implanter features scanned spot beam technology with precision implant angle and dose control to optimize device performance and yield. Process control technology minimizes all forms of contaminants to ensure absolute beam purity. Cross-platform architecture is designed to drive manufacturing flexibility and lower total cost of fab operations. This story is related to the following:Laboratory and Research Supplies and EquipmentSearch for suppliers of: Ion Implanters

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