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OneTree Microdevices Designs Ultra-Linear Amplifiers Quickly and Easily Using NI AWR Design Environment

2015-04-22 17:54:59| rfglobalnet Home Page

National Instruments (NI), formerly AWR Corporation, has announced that OneTree Microdevices is using the NI AWR Design Environment™ software to design ultra-linear amplifiers while maintaining extremely high levels of linearity. They have been successful due to the extensive non-linear design and optimization capabilities for broadband amplifiers within Microwave Office.

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Merck aims to quickly repay loans for Sigma-Aldrich acquisition

2015-04-20 15:00:39| Chemicals - Topix.net

German pharmaceutical and chemical firm Merck plans to quickly repay up to $5 billion in loans it used to finance its purchase of Sigma-Aldrich in order to prepare for further acquisitions. Marcus Kuhnert , Merck's finance chief, told the Boersen-Zeitung newspaper that the company wants to reduce the loans "very aggressively within two to three years," Reuters reports.

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Merck aims to quickly repay loans for Sigma-Aldrich acquisition

2015-04-20 15:00:38| Chemicals - Topix.net

German pharmaceutical and chemical firm Merck plans to quickly repay up to $5 billion in loans it used to finance its purchase of Sigma-Aldrich in order to prepare for further acquisitions.

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Merck aims to quickly repay up to $5 billion in loans - CFO in Boersen-Zeitung

2015-04-18 20:49:36| Chemicals - Topix.net

Germany's Merck aims to quickly repay the up to $5 billion in bank loans it needed to fund the $17 billion acquisition of U.S. lab supplies company Sigma-Aldrich , its finance chief told daily Boersen-Zeitung. "We want to reduce the loans very aggressively within two to three years to stabilise our credit rating and to regain financial leeway for further acquisitions," Marcus Kuhnert told the paper in an interview published on Saturday.

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CyberOptics Presents How to Quickly Identify and Resolve Particle...

2015-04-14 13:05:14| Electronics - Topix.net

Apr 13, 2015--CyberOptics R Corporation , a leading global developer and manufacturer of high precision 3D sensing technology solutions, will present at The 22 nd Symposium on Photomask and NGL Mask Technology in Yokohama, A poster presentation on Tuesday, April 21, from 17:25-19:10 will feature Mr. Yukinobu Hayashi, Field Application Engineer for CyberOptics, discussing how to increase efficiency and effectiveness of processes related to airborne particles in reticle mask environments. "Minimizing airborne particles in lithography applications remains a challenge if using traditional surface scan reticles, in-situ or hand-held methods.

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