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D2S and NuFlare Extend Partnership to Accelerate eBeam Computational Design Platform ...
2013-09-09 06:00:00| Industrial Newsroom - All News for Today
SAN JOSE, Calif. -- D2S®, a supplier of computational design platforms, today announced that it has extended its partnership with NuFlare Technology, a world leader in electron beam (eBeam) mask writing systems, to accelerate the deployment of eBeam technologies that reduce write times and improve the accuracy of advanced photomasks for future design nodes leveraging general purpose graphic processing unit (GPGPU) acceleration. As part of this agreement, NuFlare will invest an undisclosed ...This story is related to the following:ServicesSearch for suppliers of: Semiconductor Manufacturing Equipment Component & Part Machining |
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