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Defect Inspection System monitors defects at optical speed.

2013-05-07 14:31:08| Industrial Newsroom - All News for Today

Available for 2900 Series of defect inspection systems, NanoPoint™ focuses resources of optical inspection system on critical patterns, as identified by circuit designers or by known defect sites. During chip development, NanoPoint can reveal need for mask re-design within hours, potentially accelerating identification and resolution of design issues from months to days. During volume production, NanoPoint can selectively track defectivity within critical patterns. This story is related to the following:Inspection Devices | Wafer Inspection Systems

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