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› Dow Electronic Materials Launches New IKONIC 4000 Series CMP Polishing Pads For Ceria Polishing Applications
Dow Electronic Materials Launches New IKONIC 4000 Series CMP Polishing Pads For Ceria Polishing Applications
2014-02-14 05:26:36| chemicalonline Home Page
Dow Electronic Materials, a business unit of The Dow Chemical Company, recently introduced the IKONIC 4000 series of chemical mechanical planarization (CMP) polishing pads.
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Category:Chemicals
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