Providing full-field imprint lithography with integrated soft stamp/template fabrication capability, EVG®720 Automated UV Nanoimprint Lithography System enables throughputs of more than 60 wafers/hr. System can print nanostructures as small as 40 nm in diameter over large area in volume production. Designed to work with wide variety of resist materials, EVG720 is suited for manufacturing optics, photonics, LEDs, microfluidics, and other bioMEMS devices.
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