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Photoresist Processing System provides conformal coating.

2014-03-20 13:31:31| Industrial Newsroom - All News for Today

Available on EVG150XT Resist Coating System for high-volume manufacturing semiconductor applications, NanoSpray provides conformal coating of structures that have vertical sidewall angles, such as through-silicon vias, through-glass vias, and through-substrate vias used for 2.5D interposers and 3D-ICs. NanoSpray can deposit polymer liners ranging from 1–20 microns thick, minimizing mechanical stress and optimizing electrical performance of advanced-packaging interconnect structures. This story is related to the following:Conformal Coating Machinery |

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