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Home › Plasma Etch, Inc. Releases New Technical Details About the World's First Plasma Etching System Requiring No CF4 Gas

 

Plasma Etch, Inc. Releases New Technical Details About the World's First Plasma Etching System Requiring No CF4 Gas

2015-08-07 12:31:18| Industrial Newsroom - All News for Today

Carson City, NV Plasma Etch Inc, a leader in plasma innovation, has release new details about the workings of the Magna plasma etching system. The Magna series utilizes the newest technologies available, eliminating the need for CF4 gas, a harmful contributor to ozone layer depletion.  CF4 gas is presently used by...

Tags: no system details technical

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