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Plasma Focused Ion Beam cuts analysis from days to hours.

2015-06-08 14:31:06| Industrial Newsroom - All News for Today

Built on DualBeam™ Plasma FIB platform with integrated SEM and nanoprobing capabilities, Helios PFIB EFI delivers site-specific sample preparation with in-situ SEM end-pointing and low-beam energy SEM-based transistor characterization. It includes electron-beam absorbed current  for interconnect-level electrical fault isolation and electron-beam induced current analysis for diffusion characterization. By using FEI’s Dx delayering solution, system boosts deprocessing yields for 10 nm devices.

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Category:Industrial Goods and Services

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