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Vishay Intertechnology Enhances Precision Thin Film Chip Resistor Arrays with Tighter ...

2013-05-16 06:00:00| Industrial Newsroom - All News for Today

MALVERN, Pa. – Vishay Intertechnology, Inc. (NYSE: VSH) today announced that the company has enhanced its ACAS 0606 AT and ACAS 0612 AT precision thin film chip resistor arrays with tighter absolute tolerance, relative tolerance, and relative TCR for the new S, T, and U accuracy grades. Offering two and four integrated resistors on one substrate, respectively, the ACAS 0606 AT and ACAS 0612 AT lower costs when compared to using multiple high-precision discrete resistors, while at the ...This story is related to the following:Thin Film Resistors | Chip Resistors | Chip Arrays

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Precision Castparts Earnings Call Insights: Forged Margins and IGT Upgrades

2013-05-11 18:26:10| Industrial Machines - Topix.net

I don't know if you are willing to quantify what legacy PCP did versus what Timet did and then on a go forward basis here you have more Timet improvement, more base business incremental improvement but then you have the 29K-press situation still lingering which is kind of hard for us to model.

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Precision Castparts hits new high on big profits

2013-05-10 01:00:08| Industrial Machines - Topix.net

Precision Castparts rocketed to an all-time high in trading Thursday after breezing past Wall Street profit expectations for the fourth quarter.

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Mid-Day Market Update: Precision Castparts Rises as Rackspace Plummets

2013-05-10 00:00:14| Industrial Machines - Topix.net

Midway through trading Thursday, the Dow traded down 0.01 percent to 15,104.07 while the NASDAQ rose 0.05 percent to 3,414.18. The S&P also fell, decreasing 0.19 percent to 1,629.25. Top Headline Tesla reported earnings after the close yesterday, crushing estimates on both the top and bottom lines.

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Single Wafer High Energy Implanter offers precision, throughput.

2013-05-09 14:30:36| Industrial Newsroom - All News for Today

Incorporating single wafer LINAC technology, Purion XE ion implanter enables high-yield manufacture of sub-16 nm planar and 3D devices. System incorporates 500+ wafers/hr end station and advanced filtration systems. Latter optimize beam purity, while angle control system and constant focal length scanning deliver precise and repeatable dopant placement. Scanned spot beam architecture enables control of damage engineering as well as other advanced processes. This story is related to the following:Laboratory and Research Supplies and EquipmentIon Implantation Systems | Ion Implanters | High Voltage Accelerators | Linear Accelerators

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