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Home › Cadence and Applied Materials Collaborate on Joint Development Program to Optimize Planarization Process through Advanced CMP Modeling

 

Cadence and Applied Materials Collaborate on Joint Development Program to Optimize Planarization Process through Advanced CMP Modeling

2015-06-25 12:31:09| Industrial Newsroom - All News for Today

SAN JOSE, Calif. and SANTA CLARA, Calif.  Cadence Design Systems, Inc. (NASDAQ: CDNS) and Applied Materials, Inc. (NASDAQ: AMAT) today announced the companies are collaborating on a development program to optimize the chemical-mechanical planarization (CMP) process through silicon characterization and modeling for...

Tags: advanced development program process

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