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Cadence and Applied Materials Collaborate on Joint Development Program to Optimize Planarization Process through Advanced CMP Modeling

2015-06-25 12:31:09| Industrial Newsroom - All News for Today

SAN JOSE, Calif. and SANTA CLARA, Calif.  Cadence Design Systems, Inc. (NASDAQ: CDNS) and Applied Materials, Inc. (NASDAQ: AMAT) today announced the companies are collaborating on a development program to optimize the chemical-mechanical planarization (CMP) process through silicon characterization and modeling for...

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