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Dry Film Negative Photoresist produces hydrophobic surfaces.

2014-05-14 14:30:44| Industrial Newsroom - All News for Today

Optimized for hot roll lamination and processing on micro-electromechanical systems (MEMS) and IC wafers, DF-4017 produces hydrophobic (>90° contact angle) film surfaces. Cured chemistry withstands harsh environments, including those subject to moisture and corrosive chemicals, while glass transition temperature of 145°C and moderate modulus of 4.5 GPa at 25°C lend to toughness. Product is compatible with and can be used in contact with EMS spin coating photoresist. This story is related to the following:Photoresists

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Category:Industrial Goods and Services

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