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Home › Electroplating Systems handle

 

Electroplating Systems handle

2015-07-15 14:31:07| Industrial Newsroom - All News for Today

To optimize Through Silicon Via (TSV) and Through Wafer Via (TWV) processes, Solstice® electroplating systems provide plating for MEMS, sensors, RF, interposers, and other technologies for ≤200 mm wafers. Flexibly configurable solution combines chambers for critical blind via pre-wet operation with copper plating on automation frame. Solstice can routinely produce fully filled or lined vias with widths ranging from 5–250 micron having aspect ratios as high as 9:1.

Tags: systems handle electroplating

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