je.st
news
Ion Implanter offers extended energy option.
2015-10-19 14:31:08| Industrial Newsroom - All News for Today
Incorporating Purion Contamination Shield™ Defense System, Purion XE™ High Energy Implanter offers metals-free implant process that is designed specifically to address needs of image sensor and specialty device manufacturers. Purion Vector™ dose and angle control system, and constant focal length scanning deliver precise and repeatable dopant placement. In addition, optimized beam current performance combined with Purion™ 500 wph end station maximizes productivity.
Tags: offers
option
energy
extended
Category:Industrial Goods and Services