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Nanometrics Introduces The IMPULSE+ Integrated Metrology System For Critical Dimension And Thin Film Process Control

2016-06-10 07:22:19| metrologyworld News Articles

Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control systems, today announced the launch of IMPULSE®+, its latest system for integrated process control enabling both optical critical dimension (OCD) and thin film metrology

Tags: system control process film

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