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Reticle Inspection System monitors sub-20 nm design nodes.

2014-06-02 14:31:02| Industrial Newsroom - All News for Today

With 193 nm illumination, Teron™ SL650 assesses incoming reticle quality, monitors degradation, and detects yield-critical reticle defects, such as haze growth or contamination. System supports mix of reticle types by using STARlightSD™ and STARlightMD™ to produce defect capture and comprehensive inspection coverage on single- and multi-die reticles, respectively. Chipmakers can also use STARlightMaps™ technology to identify CD, film thickness, anti-reflective coating, and other variations. This story is related to the following:Controls and ControllersMachinery and Machining Tools Sponsored by: AMT (IMTS) - Category Sponsor April2014Search for suppliers of: Process Control Systems | Semiconductor Processing Equipment | Inspection Systems |

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