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Heidelberg Instruments Supplies Lithography Platform for Touchscreen Photomask Production

2013-11-18 06:00:00| Industrial Newsroom - All News for Today

Heidelberg, Germany &ndash; Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from a large Asian based photomask production group. System will be used in production of advanced photomasks used in the fabrication of touch panel screens.  <br /> <br /> "Growth in the touchscreen market will be driven by increasing usage of usual devices such as the smartphones and tablets, as well as a ...This story is related to the following:Printing and Duplicating EquipmentSearch for suppliers of: Touchscreen Materials |

Tags: production supplies instruments platform

 

EV Group Ships Lithography System to Micronit for Lab-on-a-Chip and Optical MEMS Device ...

2013-10-28 05:00:00| Industrial Newsroom - All News for Today

EVG®6200 mask alignment system combines wafer bonding, photolithography and nanoimprint lithography in a single, highly flexible platform<br /> <br /> FREIBURG, Germany - MICROTAS - EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has delivered an EVG®6200 semi-automated mask alignment system to Micronit, a manufacturer of lab-on-a-chip products used in life sciences applications, such ...This story is related to the following:Material Handling and Storage Sponsored by: Dalmec Inc - The Source for Manipulators and Moving TechnologiesSearch for suppliers of: Wafer Processing Systems

Tags: system group ships device

 
 

EV Group Introduces Roll-To-Roll Nanoimprint Lithography System for Biomedical, Optical, and ...

2013-10-08 06:00:00| Industrial Newsroom - All News for Today

EVG®570R2R developed with A*STAR IMRE's Industrial Consortium on Nanoimprint (ICON)<br /> <br /> DRESDEN, Germany &ndash; PLASTIC ELECTRONICS &ndash; EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG® 570R2R--the industry's first roll-to-roll thermal nanoimprint lithography (NIL) tool.  Jointly developed with the Industrial Consortium on Nanoimprint (ICON), helmed by A*STAR's Institute ...This story is related to the following:Machinery and Machining Tools Sponsored by: Haas Automation, Inc. - Category Sponsor AdWafer Processing Systems | Microlithography Equipment |

Tags: system group optical introduces

 

Seeing double: TSMC adopts new lithography technique to push Moores law to 20nm

2013-07-05 16:30:24| Extremetech

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through.

Tags: to law double technique

 

Panel Lithography System supports advanced packaging.

2013-07-01 14:31:51| Industrial Newsroom - All News for Today

Capable of processing both glass and organic laminate panels in semiconductor advanced packaging market, JetStep&trade; features on-the-fly autofocus for thick photoresists, onboard reticle library, and 6 second reticle change out wheel. System can utilize company's suite of software products, including ProcessWORKS® for run-to-run control, Discover® for yield management, and ARTIST® for fault detection and classification. This story is related to the following:Lithography Machinery

Tags: system advanced panel supports

 

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