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TSMC to Use EUV for 7nm, Says ASML
2014-12-08 23:53:02| Semiconductors - Topix.net
ASML NV, Europe's largest maker of chip-production equipment, says that Taiwan Semiconductor Manufacturing Co. plans to buy two extreme ultraviolet scanners next year to extend the boundaries of its process technology, potentially to 7 nanometers.
Intel forges ahead to 7nm without the use of EUV lasers
2014-09-25 18:30:55| Extremetech
Intel's Mark Bohr has discussed options for taking the company to 10nm and below without adopting new, troubled lithography technology -- but will extreme ultraviolet manufacturing ever be ready for prime time?
7nm EUV Could Ease 10nm Squeeze
2014-09-16 18:49:15| Semiconductors - Topix.net
Stepper-maker ASML now concedes what most of its customers have been quietly saying for a while: Companies will make 10 nm chips using only traditional immersion lithography, not its long-delayed extreme ultraviolet systems. However, that will make the 10 nm node an unpopular one that is pressed to deliver lower costs per transistor.
EUV Nudges Toward 10nm | EE Times
2014-06-05 21:44:04| Semiconductors - Topix.net
The latest extreme ultraviolet lithography systems are making about 28 wafers/hour or 100 wafers/day with a 40 W light source in pilot tests.
SXR and EUV Off-Plane Spectrometer works under vacuum.
2014-04-18 14:31:45| Industrial Newsroom - All News for Today
Conical-diffraction, off-plane X-ray Czerny-Turner (OP-XCT) operates from 8–125 nm as monochromator or imaging spectrograph for sorting laser harmonics and other applications. Unit can, with coarse diffraction grating and CCD, survey broad EUV wavelength range, dispersing 10–140 nm on 12 mm wide detector. Optical system helps maximize light throughput and minimize stretching in fast pulse laser applications, while triple grating mount improves efficiency at user-specified harmonics. This story is related to the following:Measuring Instruments |
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