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This is what the death of Moores law looks like: EUV paused indefinitely, 450mm wafers halted, and no path beyond 14nm
2014-03-17 18:50:59| Extremetech
There have been a number of events over the past few weeks that collectively point to serious problems ahead for the semiconductor market and all the players in that space. The entire economic structure that was supposed to support both Intel and the major foundries as they moved to next-generation manufacturing technologies, such as 450mm wafers, extreme ultraviolet lithography, and 20nm CMOS, is on the verge of coming apart.
Spectral Test Station serves SXR and EUV applications.
2013-11-06 14:29:40| Industrial Newsroom - All News for Today
With grazing incidence optics and light sources that work from 1–120 nm, 310STS offers flexibility for diverse analytical research activities. Sources – electron impact solid anode type for soft x-ray (SXR) and windowless hollow cathode for extreme ultraviolet (EUV) energies – fit to scanning entrance slit of 1 m focal length grazing incidence monochromator, which has adjustable apertures, accepts multiple diffraction gratings, and has PC-controlled motor drive for wavelength selection. This story is related to the following:Optics and Photonics Sponsored by: OFS Specialty Photonics Div - OFS Cat Sponsor for Vert Banner replacementSearch for suppliers of: Spectrophotometers
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