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Frost & Sullivan: Standardized Regulations Crucial For Growth In Global Dimensional Metrology Market For Medical Devices

2013-06-07 06:06:31| metrologyworld News Articles

Stringent medical device policies established by governing bodies around the world to ensure quality and patient safety will sustain investments in the global dimensional metrology market, particularly in fields such as dentistry and orthopedics

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New Vibration Measurement Application Note Helps with Complicated Metrology

2013-05-30 06:00:00| Industrial Newsroom - All News for Today

St. Paul, MN USA &ndash; Vibration and its measurement are filled with vagaries that can make a seemingly simple task a daunting one instead. A new Vibration Measurement Application Note from Lion Precision helps bring some clarity and definition to the issue. The basic problem stems from the fact that there are myriad methods and tools to measure vibration, and each of these may have different measurement units and confounding factors so the results may differ greatly.<br /> <br /> The ...

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Metrology CT System offers magnification up to 200x.

2013-05-28 14:29:38| Industrial Newsroom - All News for Today

Based on actively cooled, 225 kV micro-focus X-ray source, MCT225 HA supports range of sample sizes and material densities with 3.8+ L/50 µm MPEl accuracy in accordance with VDI/VDE 2630 guideline. System features manipulator guideways equipped with high-resolution optical encoders. Guideways are error corrected using laser interferometer mapping techniques. To minimize thermal effects, interior of enclosure is temperature controlled, creating conditioned measurement room stable to 20°C ±0.1°C. This story is related to the following:Test and Measuring InstrumentsCT Scanners | Metrology Equipment

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Renishaw focuses on precision metrology at Advanced Manufacturing 2013

2013-05-23 12:59:00| Renishaw News

Renishaw, the global engineering technologies company, will be exhibiting a range of its innovative measurement and manufacturing products at Advanced Manufacturing from 4 to 6 June 2013 at the NEC, Birmingham, UK.

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Thin Film Metrology System targets 28 nm node and below.

2013-05-14 14:31:02| Industrial Newsroom - All News for Today

Available for transparent films in advanced semiconductor fabrication applications, S3000SX&trade; System uses focused beam ellipsometry and small site measurement optics to measure thickness of single- and multi-layer films on product wafers, including device area at site sizes as small as 30 x 30 µm. Available metrology options include deep UV (190 nm) reflectometry, wafer stress and bow measurements, and next-generation airborne molecular contaminant control. This story is related to the following:Optics and PhotonicsMetrology Equipment | Metrology Instruments

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